Ellipsometry is a technique used to characterize optical properties and thicknesses of thin films by measuring the change in polarization state of light reflected from the surface of (or through) a sample.
Calculations are carried out by using physical models of specified layered structures to simulate the interaction of polarized light on the sample.
Available Model Layer Types include:
- Lorentz Oscillator
- Virtual Interface
- Surface Roughness
Xenon lamp source provides continuous spectral range of 220-2000 nm, with sharp lines between 800 and 900 nm, allowing for a thin film thickness measurement range of about 5-1000 nm
Tutorial for Ellisometry: https://www.jawoollam.com/resources/ellipsometry-tutorial