Lab Equipment and Apparatus

Surface Modification (L207)

Lab Apparatus
  • Radio frequency Planar coil inductively coupled plasma source to conduct large-scale immersed ion implantation.

  • Plasma-enhanced chemical vapor deposition (PECVD)

  • High voltage power supply

Fume Hood Information

Chemical Inventory

Emergency Resources
  • First Aid Kit

University EH&S Officer

Dr. Michael Kelley
(757) 269-5736